Step 1. Initial oxidation

Note: Include 2 dummies for PM etch characterization

Step	Process	Date	Operator
Step 1.1	TLC clean Tysar2 2TLCA 2hrs of cleaning	05/01/07	Pongracz
Step 1.2	Std. clean wafers in Sink 6 Piranha, 1/25 HF dip
Step 1.3	Dry oxidation in Tystar2, 2DRYOXA Target = 250 A 950^oC, 30 min, N2 annealing 20 min
Step 1.4	Measure oxide thickness with Nanospec: 200A