Step 19B. STI photo W#6-10

Step	Process	Date	Operator
19B.1	Std DUV litho SVGCOAT6: 1,2,1 ASML: STI on CMOS-180A reticle, MIX_MATCH_JOBS/ MIX_MATCH_4FIELDS, -0.5 deg wafer rotation Focus/Exposure matrix with 34mJ, -0.45 um center W#7,9,10 34 mJ, -0.45 um W#6,8 32 mJ, -0.45 um SVGDEV6, pr. 1,1,9, UVSCOPE UVBAKE, pr.U	08/02/07 08/03/07	Pongracz