Step 2. Zero layer photo
|
Step 2.
|
Process |
Date |
Operator |
|
2.1
|
Std. DUV litho. (delay because of ASML lens temperature problem) SVGCOAT6: 1,2,1 ASML: Zero layer with COMBI reticle, MixMatch_4fields job, PM, 30mJ, 0 um, -0.5 deg wafer rotation SVGDEV6: 1,1,9 Check the PM marks with UVSCOPE UVBAKE, pr.U Note: Alignment without wafer rotation gives a fine alignment error, but wafer is not rejected |
05/10/07 |
Pongracz |