Step 35. PMOS LDD implant

Step	Process	Date	Operator
35.1	PMOS LDD implantation Include PCH, Tploy1 Two identical implantation at two different angle: W#1-15, PCH, Tpoly1 BF2, 5E13 /cm2, 10 keV , +7^o @ zero degree orientation BF2, 5E13 /cm2, 10 keV , +7^o @ 180 degree orientation	10/09/07 - 10/15/07	Core Systems