Runcards of CMOS-180 process

                                                                                                                                                                                 

 

 

 

 

 

 

Step 0.   Starting wafers

Step 1.   Initial oxidation

Step 2.   Zero layer photo

Step 3.   Scribe wafers

Step 4.   Zero layer etch

Step 5.   Mix&Match zero layer photo

Step 6.   Mix&Match zero layer etch

Step 7.   Pad oxidation/Nitride deposition

Step 8.   N-Well photo

Step 9.   Nitride etch

Step 10. N-Well implant

Step 11. Nitride removal

Step 12. Pad oxidation/Nitride deposition

Step 13. P -Well photo

Step 14. Nitride etch

Step 15. P-Well implant

Step 16. Nitride removal

Step 17. Well drive-in

Step 18. Pad oxidation/Nitride deposition

Step 19A. Active area photo                                  Step 19B. STI photo

Step 20A. Nitride etch                                            Step 20B. Trench etch

Step 21A. P-Well field implant photo                   Step 21B. Oxide liner growth

Step 22A. P-Well field implant                              Step 22B. Dielectric deposition

Step 23A. LOCOS oxidation                                 Step 23B. Dielectric planarization

Step 24. Nitride removal

Step 25. Sacrifical oxidation

Step 26. Screen oxidation

Step 27. NMOS Vt implant photo

Step 28. NMOS Vt implant

Step 29. PMOS Vt implant photo

Step 30. PMOS Vt implant

Step 31. Gate oxidation/Poly deposition

Step 32. Poly gate photo

Step 33. Poly-Si etch

Step 34. PMOS LDD implant photo

Step 35. PMOS LDD implant

Step 36. NMOS LDD implant photo

Step 37. NMOS LDD implant

Step 38. LDD spacer deposition

Step 39. LDD spacer formation

Step 40. P+ gate & S/D photo

Step 41. P+ gate & S/D implant

Step 42 N+ gate & S/D photo

Step 43 N+ gate & S/D implant

Step 44 Back side etch

Step 45 Gate & S/D annealing

Step 46 Silicidation

Step 47 PSG deposition & densification

Step 48 Contact photo

Step 49 Contact etch

Step 50 Metal1 deposition

Step 51 Metal1 photo

Step 52 Metal1 etch

Step 53 Sintering

Step 54 Testing

Step 55 Dielectric deposition & planarization

Step 56 Via1 photo

Step 57 Via1 etch

Step 58 Metal2 deposition

Step 59 Metal2 photo

Step 60 Metal2 etch

Step 61 Testing

Step 62 Dielectric deposition & planarization

Step 63 Via2 photo

Step 64 Via2 etch

Step 65 Metal3 deposition

Step 66 Metal3 photo

Step 67 Metal3 etch

Step 68 Testing