

Runcards of CMOS-180
process
Step 5. Mix&Match
zero layer photo
Step 6. Mix&Match
zero layer etch
Step 7. Pad
oxidation/Nitride deposition
Step 12. Pad
oxidation/Nitride deposition
Step 18. Pad oxidation/Nitride deposition
Step 19A. Active area photo Step 19B. STI photo
Step 20A. Nitride etch Step 20B. Trench etch
Step 21A. P-Well field implant photo Step 21B. Oxide liner
growth
Step 22A. P-Well field implant Step 22B. Dielectric deposition
Step 23A. LOCOS oxidation Step 23B. Dielectric planarization
Step 27. NMOS Vt implant photo
Step 29. PMOS Vt implant photo
Step 31. Gate oxidation/Poly deposition
Step 34. PMOS LDD implant photo
Step 36. NMOS LDD implant photo
Step 38. LDD spacer deposition
Step 41. P+ gate & S/D implant
Step 47 PSG deposition & densification
Step 48 Contact photo
Step 49 Contact etch
Step 50 Metal1 deposition
Step 51 Metal1 photo
Step 52 Metal1 etch
Step 53 Sintering
Step 54 Testing
Step 55 Dielectric deposition & planarization
Step 56 Via1 photo
Step 57 Via1 etch
Step 58 Metal2 deposition
Step 59 Metal2 photo
Step 60 Metal2 etch
Step 61 Testing
Step 62 Dielectric deposition & planarization
Step 63 Via2 photo
Step 64 Via2 etch
Step 65 Metal3 deposition
Step 66 Metal3 photo
Step 67 Metal3 etch
Step 68 Testing