Revision History for Chapter 10 – Planarization

Rev. No.	Date	Authors	Description of Revision
10.1 – Chemical-Mechanical Polisher (CMP)
00 01 02 03 04	1/01 8/02 7/04 6/07 7/08	R. Su R. Su E. Quévy P. Monajemi E. Szentkiralyi	N/A N/A N/A - Added polysilicon-germanium in 2.0 – Purpose, a fourth bullet in Section 9.4, reference to 6” in Section 9.7, first bullet, table for 6ox6.00 in Appendix. - Grammatical corrections and clarification of operating instructions throughout the chapter.
10.2 – CMP Cleaning
00	12/06	K. Chan	N/A

7/08 - ML