Revision History for Chapter 3 – Mask Making

Rev. No.

Date

Authors

Description of Revision

3.1 - Mask Generation Using CAD Software

N/A

N/A

N/A

N/A

N/A

N/A

N/A

N/A

N/A

N/A

6/88

6/92

7/94

1/95

11/97

12/97

10/01

7/05

7/07

3/08

R. Rudell

D. Hebert

R. Moroney

M. Kraitchman

P.C. Simpson

D. Mudie

L. Voros

A. Horvath

A.      Pongracz

M. Leullier

N/A

N/A

Frequently Asked Questions

N/A

L-Edit Mask Making Manual

 N/A

Mask Making for ASML Wafer Stepper (6”)

Mask Making for GCAWS6
Added subsections 2.3.5 and 2.3.6 for dxf2gds & gds2dxf conversions 
Updated Section 2.4.1 (cifplot) to reflect the addition of the new plotter Designjet T1100 and some modified command lines.

3.2 - GCAWS2 Wafer Alignment Key Design Guide

00

01

7/05

3/08

S. Parsa

L. Petho

 
Complete rewrite of the manual; moved KIC instruction to end of the chapter.
Reviewed. Few slight modifications, no major updates.

3.3 - GCA 3600F Pattern Generator

00

01

02

03

2/96

2/06

8/07

8/08

M. Kushner

M. Kushner

M. Kushner

D. Queen

N/A

A few changes in parameters
Added mask sizes in System Specifications section.
Complete re-write of the chapter to conform to the new format.

3.4 - APT Emulsion Mask Process

00

01

12/06

3/07

M. Kushner

M. Kushner

Modified the Purpose and Scope sections and added few minor changes.

Modified the equipment operation and  mask develop process for clarity.

3.5 - APT Chrome Mask Process

00

01

02

12/99

7/02

3/07

7/07

M. Kushner

 

M. Kushner, T. Muniz

M. Kushner

Re-write of chapter in new format

N/A

New pram recipe switches and Operating Procedures

Added one line in Section 10.0 Troubleshooting Guidelines.

3.6 - Iron Oxide Masks Processing

00

01

02

3/04

5/05

6/07

M. Kushner

M. Kushner

M. Kushner

N/A

N/A

Modified Section 9.0 to describe new operating procedure at the aptchrome. Added line in 10.0 - Troubleshooting and Programs in Section 11.0.

3.7 - Ultratech Mask Copier

00

01

02

03

4/95

4/00

4/04

5/07

M. Kushner

M. Kushner

K. Chan

M. Kushner, D. Queen

N/A

N/A

N/A

Removed reference to 2" mask plates. Updated chrome intensity settings. Added 12.9 for the polarity of a chrome to iron oxide copy.

3.8 - CMOS Baseline Test Chip

00

01

6/05

3/08

A. Horvath

L. Petho

 
N/A
Few additions and corrections of links.

9/08 – ML