4.10 – Exposure Tools
4.11 ASML DUV Stepper
Model 5500/90 (6”) (asml)
4.12 GCA 8500 Wafer
Stepper (6”) (gcaws6)
4.13 GCA 6200 Wafer
Stepper (4”) (gcaws2)
4.14 Karl Suss MA6
Mask Aligner (ksaligner)
4.15
Canon
4X Projection Mask Aligner (canon)
4.16
Quintel Q4000 Mask
Aligner (quintel)
4.17
JEOL 6400 SEM & Nanometer Pattern
Generation System (jeol107)
4.18 Crestec E-Beam
Lithography System (crestec) - Moved to Marvell
Nanofabrication Lab
4.20 – Resist Treatment
4.21 SVG 8626 Photoresist Coat
Track (6”) (svgcoat1)
4.22 SVG 8626 Photoresist Coat
Track (4”) (svgcoat2)
4.23 SVGG-1 Photoresist Coat
Track (4”) (svgcoat3)
4.24 SVG 8800 Coat
Track (6”) (svgcoat6)
4.25 SVGDEV Photoresist Development Tracks (4”) (svgdev)
4.26 SVG 8800
Develop Track (6”) (svgdev6)
4.27 UVBAKE – Fusion
M150PC Photostabilizer System (uvbake)
4.28 Matrix 106 Resist
Removal System (asher)
4.29 HMDS (Primeoven & Sink4 HMDS)
4.30 Headway Photoresist Spinner (spinner1)
4.40 – Others
4.41 Mix &
Match Process (mixmatch)
4.42 Photomask Cleaning (sink12 Photomask
Cleaning Station)