4.10 – Exposure Tools
4.11 ASML DUV Stepper Model
5500/90 (6”) (asml)
4.12 GCA 8500 Wafer
Stepper (6”) (gcaws6)
4.13 GCA 6200 Wafer
Stepper (4”) (gcaws2)
4.14 Karl Suss MA6 Mask Aligner (ksaligner)
4.15
Canon 4X
Projection Mask Aligner (canon)
4.16
Quintel Q4000 Mask
Aligner (quintel)
4.17
JEOL 6400 SEM & Nanometer Pattern Generation
System (jeol107)
4.18 Crestec CABL-9510CC High Resolution Electron Beam
Lithography System (crestec)
4.20 – Resist Treatment
4.21 SVG 8626 Photoresist Coat
Track (6”) (svgcoat1)
4.22 SVG 8626 Photoresist Coat
Track (4”) (svgcoat2)
4.23 SVGG-1 Photoresist Coat
Track (4”) (svgcoat3)
4.24 SVG 8800 Coat
Track (6”) (svgcoat6)
4.25 SVGDEV Photoresist Development Tracks (4”) (svgdev)
4.26 SVG 8800 Develop
Track (6”) (svgdev6)
4.27 UVBAKE – Fusion
M150PC Photostabilizer System (uvbake)
4.28 Matrix 106 Resist
Removal System (asher)
4.29 HMDS (Primeoven & Sink4 HMDS)
4.30 Headway Photoresist Spinner (spinner1)
4.40 – Others
4.41 Mix &
Match Process (Baseline Group Report of 12/26/06)
4.42 Photomask Cleaning (sink12 photomask
cleaning station)