Chapter 5.14

Tystar 14

Boron+ Doping Furnace

(tystar14)

 

1.0         Title

         Tystar14 Boron+ Doping Furnace

2.0         Purpose

Tystar14 is a Non-MOS clean atmospheric pressure furnace that uses Boron+ solid source to dope process wafers. It accommodates twenty-four 4” wafers in one run.

3.0         Scope

This chapter covers the general furnace description of Tystar 14, process recipe loading, operation procedure, which includes wafer loading/unloading, process status monitor, user level problem diagnosis, and wafer cleaning requirements.

4.0         Applicable Documents

Revision History

4.1         Tytan Diffusion Furnace System Instruction Manual (copy in Office).

4.2         Tycom 9900 Microprocessor Control System Instruction Manual (copy in Office)

4.3         Material Safety Data Sheet for Boron+ solid source, Oxygen, and Nitrogen (copy in Lobby).

4.4         Boron+ solid source vendor web-site (TECHNEGLAS) at http://www.techneglas.com/dopantpages/boroncatalog.htm

5.0         Definitions & Process Terminology

5.1         MOS Furnace: This kind of furnaces is used to fabricate MOS devices (IC), whose performance can be greatly impacted by trace contaminants. Wafers processed in MOS clean furnaces should be MOS compatible (IC device). Absolutely no metal film in any MOS Furnace, except the MOS sintering furnace, which allows only Aluminum film.

5.2         Non-MOS Furnace: This kind of furnaces is used for Non-MOS clean process (Non IC) such as MEMS or similar application. Wafers processed in Non-MOS furnaces may contain materials that are not compatible with the MOS processes, therefore are not allowed in any MOS furnace. Wafers with metal films can be processed in some of the Non-MOS furnaces, as per defined in Chapter 1.7 (Material and Process Compatibility Policy) or with special permission from Microlab’s management.

5.3         Boron Doping: A high temperature process that diffuses boron atoms into the silicon wafer. Boron atoms provide extra electron hole to the silicon substrate, which will make it more conductive.

5.4         Annealing: A high temperature process that uses nitrogen to keep wafers in an inert atmosphere. Major applications include dopant diffusion and activation, LTO/PSG/BSG/BPSG densification, film stress release, and etc. PSG/BSG/BPSG different types of doped silicate glass (SiO2 glass).

6.0         Safety

Follow general safety guidelines in the lab as well as the specific safety rules as per follow:

6.1         Electric Shock Hazard: Tystar furnaces utilize high electric power (high amperages) to generate heat.  Do not open the side panels or touch the high power electrical parts in the furnace cabinet.

6.2         Chemical Hazard: Boron+ solid source poses low health and fire hazard. However, you should avoid inhalation of the dust or direct contact to the skin or eye. Please refer to the MSDS for first aid information.

6.3         Burn Hazard. Cantilevers, boats, and wafers coming out of the furnace are very hot.  Wear face shield when loading/unloading wafers. Proceed with caution. Avoid touching of any furnace quartz ware to prevent burning of your hands and contamination of the furnace. No flammable chemical, especially organic solvents, in the load station when the tube is open.

6.4         The process staff must check all new recipes, before they can be used on any Tystar furnaces. Customized recipes should be stored on the user’s diskette, not the standard diskettes.

7.0         Statistical/Process Data

7.1     Problem and comments section under equipment section of the wand.

7.2     Enable message for individual Tystar furnace.

8.0         Available Process, Gases, Process Notes

Available Processes

8.1         14SB+O2A     B+ doping process, which uses O2 to prevent the wafer surface damage at process temperature over 1000ºC.

8.2         14SB+N2A     B+ doping process without O2. It should only be used for process temperature below 1000ºC.

Available Gases

8.3         N2 (N2, 9999 sccm):  Used to purge out room air and keep the process tube in an inert atmosphere.

8.4         O2 (O2: 200 sccm): Used in the doping step of the Boron+ process to prevent wafer surface damage.

8.5         N2/H2: (Forming Gas, 9999 sccm): Not connected.

Process Notes

8.6         The 4” Boron+ solid source used in Tystar14 are manufactured by Techneglas, and are type GS-139 (see Section 4.4). Recommended process temperature range for these types of solid sources are between 975ºC to 1075ºC. Maximum process temperature allowed in any of our furnaces, including Tystar14 is < 1100ºC.

8.7         TYSTAR14 uses two specially made 4” boats to hold Boron+ solid sources. Process wafers are placed between two adjacent solid sources two at a time, and back-to-back facing the solid sources (front side of the wafers face the solid sources). This means each solid source will have two process wafers on both its sides facing towards it.

8.8         Dummies wafers are used in TYSTAR14 to prevent the warping of the solid sources during wafer loading/unloading.

8.9         Because the B+ solid source reacts with the moisture in the ambient air, process tube door should not be open for long period of time

8.10      Standby temperature is kept at 600ºC to minimize out diffusion of dopant material from solid sources, hence increasing their lifetime.

8.11      After the Boron+ diffusion process, a layer of boron rich film will be formed on the wafers, which need to be removed. A wet oxidation step  (900ºC for 30 minutes) followed by a 5:1 BOE in SINK8 is recommended for removing this boron rich film. For doping process longer than 10 hours, wet-oxidation time should be doubled. Failure to perform proper wet oxidation, post the diffusion step could make the film removal next to impossible.

8.12    TYSTAR14 can be used as a backup to non-MOS furnace for annealing. However, wafers with metal film should not be processed in this furnace.

9.0         Furnace Operation

9.1         Wafer Cleaning Requirements Before Loading into Tystar14 Furnace

9.1.1          Photo-resist on the wafer surface must be stripped first in PRS3000 bath of Sink5, Technics-c, or Matrix. Then cleaned in Sink8 (4”) (Non-MOS) followed by sink6 (MOS) clean.

9.1.2          For additional information note general guidelines for cleaning in Chapter 1.7 (Material and Process Compatibility) on the web.

9.2         Processing A Run

(Refer to Section 11.0, for detail information on TYCOM and ROP)

Loading a Recipe

9.2.1          Enable the Tystar 14 furnace.

9.2.2          Check that no recipe is running in furnace and the ROP displays READY.  Check that the N2PRSAL is OFF.

9.2.3          Insert the recipe diskette for the furnace into floppy drive #2, right hand side, of TYCOM CPU. Every furnace has its own standard recipe diskette.

9.2.4          If you are not sure of the recipe name, enter DI DI at TYCOM Terminal to display the recipe directory.

9.2.5          Enter LO recipe-name 14, and then press the [enter] key.

9.2.6          Enter the process parameters when prompted. You can use the numeric keypads on the keyboard, but not the [enter] key on the right end of the numeric keypad. TYCOM does not recognize this key, and will not load the recipe.

9.2.7          TYCOM Terminal displays RECIPE LOADED SUCCESSFULLY if there is no error in the recipe and parameter entries.

(Do not use TYCOM command RU # to start the process, because someone may be loading/unloading wafers on another furnace of the same bank. Besides, it is recommended that you check the ROP to make sure the recipe is loaded into the furnace.)

Load Wafers and Run a Process Recipe

9.2.8          Go to the front of the load station module of the Tystar furnace. Press [7/Status] button on the ROP to make sure the furnace is at READY state and the recipe name is correct.

9.2.9          Put on the face shield. Then press [Recipe/Run] button. The furnace door will open and the wafer boats come out. The door will close automatically after 20 minutes. If the boats start moving in and you need more time loading wafers, press [Alarm Ack] button on the ROP before the door closes, the boats will move out again and you have another 20 minutes.

9.2.10      Transfer your wafers from Sink6 to the furnace in a BLUE wafer box. Do not use the Teflon® cassette to avoid contamination. See Section 9.1 for wafer cleaning requirement.

9.2.11      Load wafers using the Non-MOS vacuum wand with black tubing. All the wafers should be loaded with their flats up for better wafer support and consistent run-to-run results.

9.2.12      Do not wear poly gloves over clean room gloves when loading/unloading wafers. The poly gloves usually are too big and slippery. The tips of the poly glove may melt on the hot quartz ware and cause contamination, which is hard to notice, because it is colorless and transparent. The poly gloves should be used at sinks and other room temperature operations only.

9.2.13      After loading wafers, press [Alarm Ack] button on the ROP. The boat will start moving into the furnace. If you want to add/remove or reposition wafers before the door closes, press [Alarm Ack] once, the boat will move out again.

9.2.14      After the door closes completely, check DNTLK on the TYCOM Terminal. If DNTLK is OFF, the process will continue automatically. You can also monitor the status of the process run remotely (Section 12.6).

9.2.15      If the DNTLK keeps ON, the process will abort after a few minutes. Press [Alarm Ack] button to silence the alarm. Check that the track and cable of the boat loader is cleared of any obstacle. Press [Recipe/Run] button again. If problem continues, report on WAND for boat loader problem.

9.2.16      You should monitor the process frequently during your run. You can use either the TYCOM terminal (Section 12.4) or WAND (Section 12.6) to do so.

Unload Wafers After Process Ends

9.2.17      When the process reaches the last step, the ROP displays END and the alarm beeps. Press [Alarm Ack] button to silence the alarm and reset the furnace to READY state.

9.2.18      To unload your wafers, press [Recipe/Run] button again, and the boats will move out. When the boats stop moving, wait a few minutes for wafers to cool down. Then use the appropriate vacuum wand to unload your wafers to the quartz boat on the cooling rack next to the furnace. The wafers may still be too hot for the plastic wafer box.

9.2.19      Press [Alarm Ack] button to move in the boats.  After the door closes completely, press [Abort] button, then [Alarm Ack], and the furnace returns to READY state. If you press [Abort] before the door closes, the boats will stop moving and the door left open. Follow Section 9.3.3 to close the door manually.

9.2.20      Disable the Tystar furnace on the WAND. Unload wafers from the cooling rack into wafer a box.

10.0            Troubleshooting Guidelines

TYCOM Terminal Problems

10.1            TYCOM Terminal is blank

Cause:     The terminal is in sleep mode.

Solution:  Press [Enter] key to activate the terminal.

Cause:     The terminal needs reset.

Solution:  Turn the terminal off, then on. Adjust brightness/contrast if needed.

Cause:     The power is off

Solution:  Make sure the terminal is turned on and the power cord in the back of the terminal is properly connected.

10.2            TYCOM Terminal displays the status of a tube continuously, and does not respond to the keyboard input.

Cause:     The previous user set the display to the continuous mode.

Solution:  Press [ctrl] and [c] keys at the same time to kill the continuous mode.   

10.3            TYCOM Terminal displays the status of a tube at a fixed interval of time repeatedly.

Cause:     Other user is checking the status of the tube remotely.

Solution:  If too many users are doing so and you cannot perform the routine TYCOM operation, contact staff to kill some of the remote checking.

10.4            TYCOM Terminal does not respond to any keyboard command at all (CPU hangs).

Cause:     TYCOM CPU needs reset.

Solution:  Follow the steps below to reset TYCOM:

Slide the TYCOM CPU out slowly.

Check that power cord and all the cables connected to the backside of the CPU are secured.

On the backside (up left corner facing the CPU), there is a black square power switch. Toggle the switch off then on.

Slide back the CPU slowly.

On TYCOM terminal, enter ACT PR, then [Enter].

Enter IN DA dd/mm/yy; enter IN TI hh:mm:ss to set the date/time.

10.5            TYCOM Terminal displays a few lines of system messages every few seconds that interferes with command inputs

Cause:     TYCOM reset was not properly finished

Solution:  Enter ACT PR when TYCOM is not displaying messages.

Check the system date/time by entering DI DA.

If the date/time is not correct, enter IN DA dd/mm/yy and IN TI hh:mm:ss.

10.6            TYCOM Terminal displays Tube I/O error message after a command is entered.

Cause:     The furnace I/O board needs to be replaced.

Solution:  Report on WAND. Equipment staff will replace the I/O board.

Process/Recipe Problems

10.7            The boat will not open or the boat loader stuck in the middle of the track with process still running.

Cause:     Something physically blocks the movement of the boat loader.

Solution:  Clear the track and the boat loader path, then try again. If the problem repeats, the boat loader needs to be reset. Report on WAND.

10.8            The process advances to the process-fail-hold step or ends without ramping up the specified doping temperature.

Cause:     The door did not close properly and DNTLK is ON.

Solution:  Abort the recipe and run it again. Make sure there is nothing on the track to block the door movement. If problem repeat, the door sensor needs to be checked. Report on WAND.

10.9            The process advances to the process-fail-hold step before the doping step is done.

Cause:     One of the process gases, e.g., O2 or N2 has been used up.

Solution:  Report on WAND

10.10        The furnace temperature does not stabilize at the doping temperature one hour after the wafer loading.

Cause:     If all 3-temperature inputs are good, it is the electronic noise.

Solution:  Press [Alarm Ack], and the process will continue to next step.

Cause:     If one of the temperature inputs is 5ºC deviate from the set point then the furnace needs be re-calibrated.

Solution:  Report on WAND.

11.0      Figures & Schematics


12.0      Appendix

General /Additional Information on Furnace Operation

12.1      Tystar Furnace Modules

The Tystar Furnace consists of three basic modules: Load Station Module, Furnace Module, and Source Cabinet Module. Microlab users can only access to the Load Station Module in the clean room area. The other two are in the Tylan service chase. Only Microlab staff with proper training has access to these two modules due to potential hazards.

The Load Station Module houses a laminar flow unit with HEPA filter for clean air distribution. A Boat Loader Unit opens/closes the furnace door and pulls-out/pushes-in the cantilevers with wafer boats sitting on top. The operation can be automatically controlled by a process recipe, or manually using the ROP (see Section 9.3).

The Furnace Module consists of a quartz process tube, thermal couples, and heating elements. It is divided into three zones: Load, Center, and Source. The temperature is controlled through a PID electronic board (DTC). All the control parameters can be set in the process recipe. The volume of the quartz tube is approximately 45 liters. The process gas flows into the tube from the Source end and vented through the holes on the Load end.

The Source Cabinet Module contains several Mass Flow Controllers (MFC) that regulate the process gas flows, the DI water vapor generator, and the TLC bubbler. A electronic gas control system MFS 460 coordinates all the MFC and interlocks for safe operation.

12.2      Tycom Terminal

The Tycom Terminal controls/monitors all the Tystar Furnace operations. It consists of a CPU with two floppy disk drives, a CRT monitor and a keyboard. Disk drive #2, on the right side, is used for viewing and loading of recipes. The auxiliary drive is used for copying diskettes.  The standard recipes for an individual furnace are stored on a floppy diskette labeled with the furnace name, e.g. TYSTAR1 STANDARD RECIPES. The floppy disk used has a special format. Please ask staff if you need one to store your customized recipes.

12.3      TYCOM Commands – TYCOM CPU only recognizes CAPITAL letters.

Commands

Function

Example

DI DI

Displays the recipe directory of the diskette in Drive #2

 

DI RE recipe name

Displays the content of a recipe on the diskette in Drive #2

DI RE 1SWETOXA

LO recipe name #

Load a recipe to a Tystar furnace

LO 2SDRYOXA 2

DI ST #

Displays current status of a Tystar furnace (see Section 9.2.2)

DI ST 3

DI DE #

Displays the system configuration of a Tystar furnace

DI DE 3

DI AL #

Displays previous process alarms of a Tystar furnace

DI AL 4

12.4      Display Furnace Status - When you use DI ST commands, the CRT monitor displays the status of the Tystar furnace. This information is very important, especially for equipment diagnosis. The following example is used to explain the information users should know. The furnace status to be displayed is Tystar2 with recipe 2SWETOXA loaded but not running (Idle state).

05/05/02

16:30:32

 

 

 

 

 

 

 

 

*=DISABLED

 

 

 

 

 

 

 

TUBE

STATUS

PROCID

 

ET

 

STEP

TIME-TO-GO

STEP ET

002

READY

2SWETOXA

 

00:00:00

 

0000

00:00:00

00:00:00

 

 

 

 

 

 

 

 

 

 

OUTPUTS

RELAYOUT

RELAYIN

INPUTS

 

 

N2 =

0.0

N2 =

ON

DNTLK =

OFF

TEMPL =

H

  752.3

1220

N2/H2 =

3000.0

N2/H2 = 

ON

CCIN2 =

OFF

TEMPC =

G

751.0

0840

O2 =

.0

O2 =

OFF

CCIN3 =

OFF

TEMPS =

L

747.2

1031