5.0 Tystar/Tylan Furnaces Overview
5.1 Tystar1 MOS
Clean Gate Oxidation Atmospheric Furnace (4" and 6")
5.2 Tystar2 MOS
Clean Dry/Wet Oxidation and Anneal Atmospheric Furnace (4" and 6")
5.3 Tystar3
Non-MOS Clean Dry/Wet Oxidation and Anneal Atmospheric Furnace (4" and
6")
5.4
Tystar4
Non-MOS Clean Dry/Wet Oxidation and Anneal Atmospheric Furnace (4" and
6")
5.5 Tylan5 MOS Clean Gate/Dry Oxidation and Annealing Atmospheric Furnace (4”
Only)
5.6 Tylan6 MOS Clean Gate/Dry Oxidation and Annealing Atmospheric Furnace (4”
Only)
5.7 Tylan7 MOS Clean Gate/Dry Oxidation and Annealing Atmospheric Furnace (4”
Only)
5.8 Tylan8
Compound Semiconductor Oxidation Furnace (1 cm Only)
5.9 Tystar9 MOS
Clean Silicon Nitride (Si3N4) LPCVD Furnace (4" and 6")
5.10 Tystar10
MOS Clean Polycrystalline Silicon LPCVD Furnace (4" and 6")
5.11 Tystar11
MOS Clean LTO LPCVD Furnace (4" and 6")
5.12 Tystar12
Non-MOS Clean LTO LPCVD Furnace (4" and 5")
5.13 Tystar13
Non-MOS Clean POCl3 Doping Furnace (4” and 6”)
5.14 Tystar14
Boron+ Doping Furnace
5.15 Tystar15
Non-MOS Polysilicon Carbide LPCVD Furnace
5.16 Tystar16
Non-MOS LPCVD Furnace
5.17
Tystar17
Non-MOS Low Stress Nitride and High Temperature Oxide LPCVD Furnace (4” and 6”)
5.18
Tystar18
MOS Clean Aluminum Sintering Atmospheric Furnace (4” and 6”)
5.19 Tystar19
MOS Clean Si-Ge LPCVD Furnaces (4" and 6")
5.20
Tystar20
Non-MOS Clean Si-Ge LPCVD Furnace (4" and
6")
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5.30
Contamination
Monitoring of MOS-Clean Furnaces
5.31
Heatpulse1
– Rapid Thermal Annealing With Heatpulse 210T RTA
System
5.32
Heatpulse2–
Rapid Thermal Annealing With Heatpulse 610T RTA
System
5.33
Heatpulse3
– MOS Clean Rapid Thermal Annealing System
5.34
Heatpulse4
– MOS and Non-MOS Rapid Thermal Annealing System
5.35
Nanox Atmospheric Furnace for Growing Carbon Nanotubes
5.36
YES Vacuum
Furnace (Polymide Curing and Annealing Furnace)