Chapter 5 - Diffusion Furnaces/Ovens

5.1 Tystar1 MOS Clean Gate Oxidation Atmospheric Furnace (4" and 6")

5.2 Tystar2 MOS Clean Dry/Wet Oxidation and Anneal Atmospheric Furnace (4" and 6")

5.3 Tystar3 Non-MOS Clean Dry/Wet Oxidation and Anneal Atmospheric Furnace (4" and 6")

5.4 Tystar4 Non-MOS Clean Dry/Wet Oxidation and Anneal Atmospheric Furnace (4" and 6")

5.5 Tylan5 MOS Clean Gate/Dry Oxidation and Annealing Atmospheric Furnace (4” Only)

5.6 Tylan6 MOS Clean Gate/Dry Oxidation and Annealing Atmospheric Furnace (4” Only)

5.7 Tylan7 MOS Clean Gate/Dry Oxidation and Annealing Atmospheric Furnace (4” Only)

5.8 Tylan8 GaAs Anneal

5.9 Tystar9 MOS Clean Silicon Nitride (Si3N4) LPCVD Furnace (4" and 6")

5.10 Tystar10 MOS Clean Polycrystalline Silicon LPCVD Furnace (4" and 6")

5.11 Tystar11 MOS Clean LTO LPCVD Furnace (4" and 6")

5.12 Tystar12 Non-MOS Clean LTO LPCVD Furnace (4" and 5")

5.13 Tystar13 Non-MOS Clean POCl3 Doping Furnace (4” and 6”)

5.14 Tystar14 Boron+ Doping Furnace

5.15 Tystar15 Non-MOS Polysilicon Carbide LPCVD Furnace

5.16 Tystar16 Non-MOS LPCVD Furnace

5.17 Tystar17 Non-MOS Low Stress Nitride and High Temperature Oxide LPCVD Furnace (4” and 6”)

5.18 Tystar18 MOS Clean Aluminum Sintering Atmospheric Furnace (4” and 6”)

5.19 Tystar19 MOS Clean Si-Ge LPCVD Furnaces (4" and 6")

5.20 Tystar20 Non-MOS Clean Si-Ge LPCVD Furnace (4" and 6")

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5.31 Heatpulse1 – Rapid Thermal Annealing With Heatpulse 210T RTA System

5.32 Heatpulse2– Rapid Thermal Annealing With Heatpulse 210T RTA System (Work in progress…)

5.33 Heatpulse3 – MOS Clean Rapid Thermal Annealing System

5.34 Heatpulse4 – MOS and Non-MOS Rapid Thermal Annealing System