Lab Members Meeting

5 May 2005

Present: 9 lab members, 4 staff

A general discussion was held concerning login abuse by some lab members. Abuse includes zero-time equipment enables and failure to login after hours and on weekends. Lab members are reminded such abuses lead to suspension of Microlab access and accounts. Lab members can assist in sustaining Microlab policy by politely reminding errant lab members to login and enable equipment. Lab members can also report abuses to the office for follow-up by e-mail or via the suggestion box in the hallway.

Equipment and Lab Updates

asml:          We are working toward replacement of the asml excimer laser source. This is a complex task both in fitting a newer laser to our vintage machine and in finding vendor support for this upgrade. In the meantime we will continue to work to support the asml.

 

centura:     The end point computer has issues. We are trying to get a fix from Applied Materials for this problem.

 

cmp:          Will be relocated for better access and support. The cmpwc has been removed from service and will be replaced with a manual wet process station. A new style of pad is on order, i.e. K-groove pad that may prove more process-uniform than the current pads. An additional location will be created for the use of a second slurry type.

 

ptherm:      CHF3 is installed on gas channel 5 so it can be used simultaneously with CF4 and other gases.

 

room432:    Ageneral complaint exists concerning the air temperature in the 432 area. A contractor has surveyed the area. We are awaiting a bid to repair the air distribution system above the ceiling. We are working toward a fix.

 

oxford2:     Up and running process. Lab members needing PECVD nitride or oxide can qualify and use oxford2. A manual is online for review. oxford2 is an open-use tool. Samples processed in oxford2 should not be processed in the VLSI area without permission from Sia Parsa. He has been added. A toggle function for using O2 in place of N2O is being added. This will be done is such a way SiH4 cannot be run with O2 as it will immediately react and clog the gas input line. Oxford Instruments is working on supplying a system upgrade to allow dual-frequency generators for controlling stress in films.

 

ksaligner:   The ksaligner was damaged by an inexperienced user. This lab member has been retrained. The replacement cost of the damaged component is $30k. We have made repairs in-house. Lab members using precision tools are reminded mistakes result in costly repairs and adversely impact their colleague’s research.

 

Process

amst:            Installed and available for organo-silane vapor-phase surface modification. The standard process is deposition of a monolayer of fluoroctatrichlorosilane (FOTS), which renders silicon surfaces hydrophobic. Water contact angle after FOTS deposition = 110°. Deposition of lab member defined specialty compounds is possible.  A labmember from the Chemistry Dept has recently tested a process for deposition of aminopropyltrimethoxysilane. This compound provides an amine reactive silicon surface for enabling covalent attachment of biochemical compounds to silicon.

 

gcaws:         DFAS, a precision die x die overlay utility for the gcaws6 is under test. Once the details have been worked out lab members will be offered training on the DFAS feature.

 

spinner1:      PR for individual lab member containers is available from the bottles located on the top shelf of the CY-2 yellow flammables cabinet. PR on the lower shelf is not accessible to lab members and has been isolated and locked.

 

SU-8             Based on lab member request, SU-8 developer is now stocked in the lobby chem. cabinets. Lab members no longer need to stock their own bottles.

developer:   The SU-8 developer is compatible with all SU-8 resist formulations. SU-8 users are advised that the Microlab standard positive photoresist stripper (PRS-3000) is effective as an SU-8 stripper. The specialty product sold by MicroChem (Nanoremover PG) as an SU-8 stripper contains 99% N-methyl pyrolidone; PRS-3000 contains approximately 60% of the same compound.

Etiquette & Safety

Campus Environment Health & Safety inspected the Microlab. Overall they remain impressed with Microlab safety. Areas found in need of improvement:

a)       chemical bottles left on the floor around work areas

b)       unlabeled chemical bottles and processes – can result in heavy fines!!

c)       missing CHEMICAL WASTE clipboard at sink4

d)       c-locker doors left open

Lab members are reminded a suggestion box exists in the main corridor. Anonymous suggestions can be placed in this box. Over the years, lab members have made numerous suggestions via this box, which have had value in supporting the lab and implementing effective safety protocols. Recent example: a suggestion to add clips to the fume hoods and wet process stations to hold process labels.

                                                                                                                                                                                                            RH - May 2005