MEMORANDUM
To: Katalin Voros, Operations Manager
From: Marilyn Kushner, Junior Development Engineer
Cc: Sia Parsa, Process Supervisor
Subject: 2006 Year-End Report
The photolithography equipment used in processing that are
under my direct involvement are: the GCA Wafer Stepper(2), the GCA Pattern
Generator, and the Ultratech Mask Copier. Additional equipment in this group
includes the APT chrome and emulsion mask developers.
The online
mask-making form for mask-making requests is utilized by all lab members
submitting a Mask request, as well as other university affiliated researchers
and BMLA lab members.
Mask-making requests are accepted
for both the GCA Wafer Steppers (gcaws2 and gcaws6), the Quintel contact
printer, the Karl Suss contact aligner, and the Canon 4:1 reduction printer.
Requests are also accepted for the advanced lithography ASML stepper.
The pattern generator continues to
be heavily utilized by myself and the small group of lab members who are
qualified to operate it. A total of 1053 completed photomasks were logged into
the gcapg log book by the end of the calendar year, December 31st. Note: the drop in the mask total from last
year (1275) was largely caused by out-sourcing to Photo Sciences, Inc. for mask
geometries less than two microns, which are below our machine capability and/or
resolution.
Former Microlab lab members who are now faculty within the UC system as
well as other universities throughout the United States continue to be
tremendously loyal and supportive of the Microlab’s mask-making facilities and
refer our services to research groups within their own university systems; this
is especially so for the University of
Maryland. Several of the graduates of the above institutions are now faculty
elsewhere and continue to support the mask-making facilities. This year
my mask-making went international- details below.
New for 2006:
|
University |
Contact |
Department |
|
Duke
University |
Alexander
Tselev |
Gross
Chemical Lab |
|
NIST,
Gaithersburg, MD |
Neil
Zimmerman |
n/a |
|
Oregon
State University |
Anna
An |
EECS
|
|
Stanford
University |
Katherine Tsai |
n/a |
|
Université de Montpellier,
France |
Claire
Fournier |
LAMMI |
|
University
of British Columbia |
Alina
Kulpa |
n/a |
|
UC
Irvine |
LiMei
Yang |
n/a |
|
UC
Santa Barbara |
LK
Shen |
n/a |
|
University
of Michigan |
Nikolas
Chronis |
Mechanical
Engineering |
Ongoing:
|
University |
Contact |
Department |
|
Caltech |
Blake Axelrod |
Condensed Matter Physics |
|
Georgetown University |
Prof. Paola Barbara |
Dept. of Physics
and Pharmacology |
|
Oak Ridge National Laboratory |
Kai Xiao |
Center for Nanophase Materials Science |
|
Penn State University |
Prof. Jeff Zahn & students |
n/a |
|
Rensselaer Polytechnic Institute |
Prof. Theo Borca-Tasciuc |
Dept. of Mechanical Engineering |
|
Texas Tech University |
Prof. Shaorong Liu |
Dept. of Physics and Biochemistry |
|
n/a |
Center
for Superconductivity Material
Research Science and Engineering Center Maryland
MEMS lab Dept. of
Mechanical Engg./Institute for Systems Research New this
year: Nanoelectronics Research Group |
|
|
University of Pittsburgh |
Di Gao |
n/a |
University of Texas at Austin
|
Prof. Li Shi and students Dmitriy Korobkin |
Mechanical Engineering Department Institute for Fusion Studies |
|
Vanderbilt University |
Deyuli Li |
n/a |
The GCA Pattern Generator as scheduled monthly maintenance tasks that
are performed on a routine basis. They are: the mercury lamp change every 700
hours (followed by focus/exposure tests for chrome and iron oxide after the
lamp has burned in for 24 hrs.) Emulsion focus/exposure tests are done on
a “as needed” basis. Other tests for
the pattern generator are the angles and alignment test, and the stage motion
tolerance test. By strictly adhering to a six-month major maintenance call to
RZ Associates for stage maintenance, most minor problems for the pattern
generator have been eliminated and machine uptime for this tool is excellent.
GCA Wafer Stepper (gcaws2)
The GCA Wafer Stepper has a scheduled mercury arc lamp change every 900 hours; this is performed by Evan Stateler, the engineer-in-charge for this equipment. After a 24-hr. lamp burn-in, new focus and exposure tests are performed to determine the best focus and exposure times for both I-line and G-line resists. A clear energy test follows, then a baseline correction. The baseline correction test is also performed once and week and on request.
GCA Wafer Stepper 6-inch tool (gcaws6)
For this new 6” tool, I am sharing the preventive
maintenance with Kim Chan. A weekly baseline test is performed, as well as
other minor preventive maintenance chores. Under Kim’s instruction, I have
learned to operate this tool and assist lab members with it and have also set up
group accounts for it. I have also learned the micro-DFAS baseline for this as
well.
ASML Stepper (asml): Twice a week I perform the ICQ tests and illumination uniformity.
SVG
Photoresist Coating Tracks (svgcoat1 and svgcoat2)
Photoresist
thickness tests for I-line, G-line, and the 220 thick resist are
performed monthly.
Every
year it becomes more of a challenge to keep the Microlab tidy and presentable-
not only for guests but for everyday labmembers as well. Therefore, the annual
Microlab CleanFest in October is a must.
This
year 120 lab members signed up and once again their efforts - appreciated by
all - made a tremendous difference in the lab’s overall appearance and boosted
morale.
The daily “grab-bag” giveaway continues to be
popular; prizes were gathered from the Semicon West Show at the Moscone Center.
Prize-filled tote bags were also given to the first
lab member to sign up for this event, as well as the “most cheerful, willing
participant”.
Photolithography
The GCA Wafer Stepper-2 was given a PC and a software upgrade from RZ
Associates; when the installation was completed Greg Mullins instructed me on
the changes and I then scheduled. Two classes for gcaws2 qualified labmembers
to learn the new system. ASML Mix-andMatch Photomasks: gave top priority to the
ASML photomask requests for the ASML-GCAWS6 mix-and-match process.
Mask-Making Web Site
Worked with Katalin Voros and Sia Parsa to update the mask-making link
on the Microlab home page to direct off-site mask requestors to create their own
conversions using the Artwork Conversion Software that is now provided to
non-labmembers.
Staff Photography
The “Good News” photo display case located midway down the main hallway
outside the Microlab is also maintained by myself; it is a revolving display of
life inside the Microlab.
Microlab Annual Summer
Barbecue
This year I again chaired the barbecue committee in general and was
aided by several co-chairs: Madeleine Leullier for publicity; Warner Carlisle for grilling; and Joe Donnelly for sports.
The student staff position that was created to keep the
coffee room, Microlab lobby and the Microlab in general looking presentable continues to work out
well; this student employee, under my general supervision, works with a high
level of independence and manages this job quite well; tasks are added as the
need arises. I also supervise the student staff that stocks chemicals and lab
supplies for the Microlab and packages up chemical waste for pickup by
EH&S.
The major photolithography equipment (the GCA Wafer
Stepper and the GCA Pattern Generator) continue to be among the most heavily
used pieces of equipment in the Microlab. For both pieces of this equipment lab
members tend to train each other, but I continue to grade the written tests and
conduct the oral exams.
Following the Microlab Orientation course and lab tour, each new lab member is required
to take the Microlab Safety Test. The questions from this test are from the
orientation, safety video, lab tour and study handouts. This test is reviewed
and updated once per year by Bob Hamilton and myself.
The Microlab suggestion box (located in the main
Microlab hallway) is checked periodically for new safety suggestions submitted
by lab members. The items brought up are discussed with the Microlab manager.
To date, the submissions continue to be excellent and I work with our safety
manager to implement them as soon as possible.
Equipment manuals need to be revised and/or updated
frequently to reflect changes in processing and/or procedures. The following
chapters have been updated or revised this year:
Chapter
3.3: GCA Pattern Generator- done in 7/06. This chapter was updated to have key
operating instructions put into bold type in Section 3.0. The current job parameters were also
updated.
Chapter 3.4: APTemulsion Mask Developer- done in 12/06. This chapter was
updated to describe the emulsion mask develop process only, with references to
the chrome mask developer deleted.
This year, I was one of
the nine ERSO employees to be recognized as the first recipients of the SPOT
Award for achieving one or more of the program’s criteria of collaboration,
inclusion, initiative, result-orientation, service or stewardship.
Specifically, I was cited for organizing the successful Microlab CleanFest.