MEMORANDUM

 

 To:            Katalin Voros, Operations Manager

 From:       Kim Chan, Assistant Development Engineer

 Subject:    2007 Year-End Report

 Date:        18 January 2008

 cc:            Sia Parsa, Professor Andy Neureuther

 

This is a summary of the activities and projects that I was involved during 2007

I.         SEMICONDUCTOR   PROCESSING

I have been working on special photoresist and lithography projects with the Advanced Lithography Group. 

I have been working on special projects for the Microlab process group.

 

 

Processing involved many silicon equipment and analytical instruments in the Microlab.  This year I learned how to use the centura-dps system, flash process on uvbake system and negative sheet resist process.  Attended the wafersaw training session and watched how to deposit FOTS film on amst system. 

II.            EQUIPMENT &  PROCESS  MAINTENANCE

 Equipment Maintenance

 Process Maintenance

 I have been responsible to maintain general photolithography processes for the Advanced  Photolithography Group.  This involved the following:

I have been responsible to maintain part of the general photolithography processes for the Microlab and the process group.  This involved the following:

III.          INSTRUCTION  &  DOCUMENTATION

 Instruction

-          Wafer stepper 2 & 6

-          Kruss Contact Angle Measurement System

-          LEO S.E.M.

-          Matrix asher

-          Memscope

-          Nanoduv Microspectrophotometer

-          Svgcoat6 and svgdev6

-          Sink432A, sink432C and sink3

-          Sopra ellipsometer

-          UVScope

-          Vacoven

-          Canon projection aligner

-          GCA wafer stepper 6

-          Headway spinner

-          Hummer sputter system

-          Jeol107  sem

-          Kruss Contact Angle Measurement System

-          LEO sem

-          Matrix asher

-          Nanoduv

-          Nanospec

-          Primeoven

-          Quintel aligner

-          Sinkcmp spinner

-          Sinks

-          Sopra ellipsometer

-          SVG coat and develop systems

-          Technics-c asher

-          UVScope

-          Vacoven

-          YES prime oven

 Documentation

IV.          SUMMARY

I had assisted Marshal Miller on his shotnoise experiments, so he could analyze the data.  I had prepared thin photoresists for him to do the EBL in LBL.  I grew oxide on wafers, coated with various resists, ran preliminary exposure tests, etched thin oxide patterns on wafers after Marshal did the EBL in LBL, stripped the resists and took SEM pictures before and after stripping the resists and after oxide etch for Marshal to analyze the data on his shotnoise experiments.  I had assisted the Advanced Lithography Group to run the experimental process well this year.

I had completed many ETR runs, had assisted staff and lab members to make processes run smoothly in the Microlab.  I had assisted the Microlab to maintain equipment when necessary to keep equipment in good running conditions and minimize equipment down time. I had graded written quizzes and qualified lab members on equipment so the lab members could use the Microlab facility. I had revised chapter manuals, process modules and written quizzes to keep them updated.  I had made masks when Marilyn was away on vacation so lab members could continue their work.  I had assisted the process group to maintain the general processes in the lab to run smoothly this year.